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The Influence of Diffusion Fluxes on the Detection Limit of the Jalpaite Copper Ion-Selective Electrode
Journal article   Peer reviewed

The Influence of Diffusion Fluxes on the Detection Limit of the Jalpaite Copper Ion-Selective Electrode

A Zirino, Roland De Marco, I Rivera and B Pejcic
Electroanalysis, Vol.14(7-8), pp.493-498
2002
url
https://doi.org/10.1002/1521-4109(200204)14:7/8<493::AID-ELAN493>3.0.CO;2-CView
Published Version

Abstract

copper ion-selective electroder rotating disk electroder electrode dissolutionr diffusion fluxr seawater
It has been suggested that electrode dissolution and the concomitant saturation of the electrode's diffusion layer restricts the detection limit of the jalpaite Cu ion-selective electrode (ISE) to samples with total Cu levels above 10-6 mol dm-3 [1, 2]. This article will use rotating disk electrode (RDE) data for San Diego Bay seawater and Fick's law of diffusion to demonstrate that the static commercial Orion Cu ISE (employing a jalpaite membrane) produces a background level of contamination of (2.0±0.5) × 10-8 mol dm-3 total Cu, and the reduced thickness of the Orion Cu ISE's diffusion layer in the presence of hydrodynamic flow [e.g., at an RDE, or in continuous flow analysis (CFA)] lowers the background contamination of Cu to < 10-9 mol dm-3. Furthermore, the RDE Cu ISE employing an electrode fabricated using jalpaite precipitated in 80% excess Na2S, so as to minimize the presence of occluded and leachable Cu2+ salts and extraneous phases such as silver sulfide [3 - 5], reveals an improvement in the lower limit of detection compared to the commercial Orion Cu ISE.

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Chemistry, Analytical
Electrochemistry
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