Influence of Si(1 0 0) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition

K S Finnie; G Triani; K Short; D R G Mitchell; D J Attard; John R Bartlett; C J Barbé

doi:10.1016/S0040-6090(03)00818-6

Back

Influence of Si(1 0 0) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition

Journal article

Peer reviewed

Influence of Si(1 0 0) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition

K S Finnie, G Triani, K Short, D R G Mitchell, D J Attard, John R Bartlett and C J Barbé

Thin Solid Films, Vol.440(1-2), pp.109-116

2003

DOI: https://doi.org/10.1016/S0040-6090(03)00818-6

Files and links (1)

url

https://doi.org/10.1016/S0040-6090(03)00818-6View

Published Version

Abstract

Physical Sciences

Engineering

Technology

The effect of water plasma treatment of both hydrophobic and hydrophilic Si(1 0 0) surfaces has been studied using infrared spectroscopy to monitor the various surface species present. Exposure to a water plasma results in a significant increase in the concentration of H-bonded hydroxyls and hydrides. Both atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM) of TiO2 films deposited by atomic layer deposition at 300 °C, show that the morphology of the films is dependent on the nature of the initial surface. XTEM of the early stages of growth showed that coatings on hydrophilic substrates deposited as initially amorphous and continuous films, which crystallised with further growth. However, the hydrophobic substrate produced island growth of small, crystalline grains. AFM images of 23-nm thick films showed that films deposited on hydrophobic and hydrophilic Si consisted of 35-100 and 150-350 nm crystallites, respectively. A film on water plasma treated Si, closely resembled that on the hydrophilic surface, indicating that hydroxyl groups are responsible for directing the film growth

Details

Title: Influence of Si(1 0 0) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition
Authors: K S Finnie (Author) - Australian Nuclear Science and Technology Organisation
G Triani (Author) - Australian Nuclear Science and Technology Organisation
K Short (Author) - Australian Nuclear Science and Technology Organisation
D R G Mitchell (Author) - Australian Nuclear Science and Technology Organisation
D J Attard (Author) - Australian Nuclear Science and Technology Organisation
John R Bartlett (Author) - Australian Nuclear Science and Technology Organisation
C J Barbé (Author) - Australian Nuclear Science and Technology Organisation
Publication details: Thin Solid Films, Vol.440(1-2), pp.109-116
Publisher: Elsevier S.A.
Date published: 2003
DOI: 10.1016/S0040-6090(03)00818-6
ISSN: 0040-6090
Organisation Unit: School of Science and Engineering - Legacy; University of the Sunshine Coast, Queensland
Language: English
Record Identifier: 99449085502621
Output Type: Journal article

Metrics

4 File views/ downloads

1253 Record Views

28 Times Cited - Web of Science

InCites Highlights

These are selected metrics from InCites Benchmarking & Analytics tool, related to this output

Web Of Science research areas: Materials Science, Coatings & Films; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter