Characterisation of metal oxide films deposited by non-hydrolytic ALD

P J Evans; P H Mutin; G Triani; K E Prince; John R Bartlett

doi:10.1002/sia.2305

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Characterisation of metal oxide films deposited by non-hydrolytic ALD

Journal article

Peer reviewed

Characterisation of metal oxide films deposited by non-hydrolytic ALD

P J Evans, P H Mutin, G Triani, K E Prince and John R Bartlett

Surface and Interface Analysis, Vol.38(4), pp.740-743

2006

DOI: https://doi.org/10.1002/sia.2305

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Abstract

Physical Chemistry (incl. Structural)

Condensed Matter Physics

Atomic layer deposition (ALD) has become an established technique for producing thin films of a wide range of materials. Of particular note is the extensive research on the use of ALD metal oxide films as the replacement for the high-k SiO2 dielectric layer in future semiconductor devices. In much of this work, metal halides or metallorganics combined with water, peroxide or ozone have served as precursors for the sequential deposition process that forms the basis of ALD. Alternative reaction schemes, such as those in which metal halides are reacted with metal alkoxides, have also been investigated with some success though higher temperatures are often required for film deposition. However, the effect of alternative oxidising species in ALD has not been extensively studied in terms of both their efficacy and their influence on the film growth process. Here we describe recent work on the use of t-butyl alcohol (tBA) and di-isopropyl ether (DIPE) for the ALD of titania films from titanium tetrachloride. A quartz crystal microbalance (QCM) was used to monitor film growth in real time. Films were also grown on silicon wafers for post-deposition analysis. Spectroscopic ellipsometry, atomic force microscopy (AFM), X-ray diffraction (XRD) and secondary ion mass spectrometry (SIMS) were used for this purpose. The results obtained from this combination of surface analytical techniques will be discussed in detail in order to illustrate the strength of this approach for the elucidation of ALD film growth by means of non-hydrolytic reactions.

Details

Title: Characterisation of metal oxide films deposited by non-hydrolytic ALD
Authors: P J Evans (Author) - Australian Nuclear Science and Technology Organisation
P H Mutin (Author) - Universite´ Montpellier 2, France
G Triani (Author) - Australian Nuclear Science and Technology Organisation
K E Prince (Author) - Australian Nuclear Science and Technology Organisation
John R Bartlett (Author) - Australian Nuclear Science and Technology Organisation
Publication details: Surface and Interface Analysis, Vol.38(4), pp.740-743
Publisher: John Wiley & Sons Ltd.
Date published: 2006
DOI: 10.1002/sia.2305
ISSN: 0142-2421
Organisation Unit: School of Science and Engineering - Legacy; University of the Sunshine Coast, Queensland
Language: English
Record Identifier: 99448935902621
Output Type: Journal article

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Collaboration types: Domestic collaboration; International collaboration
Web Of Science research areas: Chemistry, Physical