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Atomic layer deposition of TiO2 and Al2O3 thin films and nanolaminates
Journal article   Peer reviewed

Atomic layer deposition of TiO2 and Al2O3 thin films and nanolaminates

D R G Mitchell, G Triani, D J Attard, K S Finnie, P J Evans, C J Barbé and John R Bartlett
Smart Materials and Structures, Vol.15(1), pp.S57-S64
2006
url
https://doi.org/10.1088/0964-1726/15/1/010View
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Abstract

Chemical Sciences Engineering

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Instruments & Instrumentation
Materials Science, Multidisciplinary
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