Atomic layer deposition of TiO2/Al2O3 films for optical applications

G Triani; P J Evans; D R G Mitchell; D J Attard; K S Finnie; M James; T Hanley; B A Latella; K E Prince; John R Bartlett

doi:10.1117/12.638039

Back

Atomic layer deposition of TiO2/Al2O3 films for optical applications

Conference paper

Peer reviewed

Atomic layer deposition of TiO2/Al2O3 films for optical applications

G Triani, P J Evans, D R G Mitchell, D J Attard, K S Finnie, M James, T Hanley, B A Latella, K E Prince and John R Bartlett

Proceedings of the 2005 International Society for Optical Engineering Conference, Vol.5870, pp.76-85

International Society for Optical Engineering Conference: Advances in Thin-Film Coatings for Optical Applications, 2005 (San Diego, United States, 31-Jul-2005)

SPIE: International Society for Optical Engineering

2005

DOI: https://doi.org/10.1117/12.638039

Files and links (1)

url

https://doi.org/10.1117/12.638039View

Published Version

Abstract

Macromolecular and Materials Chemistry

Atomic layer deposition (ALD) is an important technology for depositing functional coatings on accessible, reactive surfaces with precise control of thickness and nanostructure. Unlike conventional chemical vapour deposition, where growth rate is dependent on reactant flux, ALD employs sequential surface chemical reactions to saturate a surface with a (sub-) monolayer of reactive compounds such as metal alkoxides or covalent halides, followed by reaction with a second compound such as water to deposit coatings layer-by-layer. A judicious choice of reactants and processing conditions ensures that the reactions are self-limiting, resulting in controlled film growth with excellent conformality to the substrate. This paper investigates the deposition and characterisation of multi-layer TiO2/Al2O3 films on a range of substrates, including silicon ã€ˆ100ã€‰, soda glass and polycarbonate, using titanium tetrachloride/water and trimethylaluminium/water as precursor couples. Structure-property correlations were established using a suite of analytical tools, including transmission electron microscopy (TEM), secondary ion mass spectrometry (SIMS), X-ray reflectometry (XRR) and spectroscopic ellipsometry (SE). The evolution of nanostructure and composition of multi-layer high/low refractive index stacks are discussed as a function of deposition parameters.

Details

Title: Atomic layer deposition of TiO2/Al2O3 films for optical applications
Authors: G Triani (Author)
P J Evans (Author)
D R G Mitchell (Author)
D J Attard (Author)
K S Finnie (Author)
M James (Author)
T Hanley (Author)
B A Latella (Author)
K E Prince (Author)
John R Bartlett (Author)
Contributors: M L Fulton (Editor)
J D T Kruschwitz (Editor)
Publication details: Proceedings of the 2005 International Society for Optical Engineering Conference, Vol.5870, pp.76-85
Conference details: International Society for Optical Engineering Conference: Advances in Thin-Film Coatings for Optical Applications, 2005 (San Diego, United States, 31-Jul-2005)
Publisher: SPIE: International Society for Optical Engineering
Date published: 2005
DOI: 10.1117/12.638039
Organisation Unit: School of Science and Engineering - Legacy; University of the Sunshine Coast, Queensland
Language: English
Record Identifier: 99447754302621
Output Type: Conference paper

Metrics

4 File views/ downloads

892 Record Views