Characterisation of alumina-silica films deposited by ALD

K E Prince; P J Evans; G Triani; Z Zhang; John R Bartlett

doi:10.1002/sia.2422

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Characterisation of alumina-silica films deposited by ALD

Journal article

Peer reviewed

Characterisation of alumina-silica films deposited by ALD

K E Prince, P J Evans, G Triani, Z Zhang and John R Bartlett

Surface and Interface Analysis, Vol.38(12-13), pp.1692-1695

2006

DOI: https://doi.org/10.1002/sia.2422

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Abstract

Physical Chemistry (incl. Structural)

Condensed Matter Physics

Atomic layer deposition (ALD) is a surface mediated chemical vapour deposition method that is capable of producing uniform films over large areas. In addition, the technique has been used to deposit highly conformal films on high aspect ratio structures. The applicability of any film deposition technique is dependent upon the properties of the final product. Many applications, such as optical coatings, require films of constant composition, low levels of impurities, and adherent interfaces. The latter may derive its strength from some form of interfacial mixing but this should not have an adverse effect on film performance. Dynamic SIMS (D-SIMS) offers a versatile tool for monitoring film and interface compositions as a function of depth. Sputtering the surface with Cs + primary ions and detecting MCs + secondary ions was found to offer the best analytical conditions for ALD films. In the present study, D-SIMS has been used to characterise films grown with silicon-containing precursors at temperatures between 200 and 300°C. The D-SIMS results have been complemented with data obtained from XPS and an in situ quartz crystal microbalance (QCM). This combination of analytical techniques enabled the effects of different ALD process conditions to be evaluated. With this approach, it was possible to compare the relative amounts of Si in the films, determined by SIMS and XFS, with the mass gains measured for different pulsing sequences with the QCM.

Details

Title: Characterisation of alumina-silica films deposited by ALD
Authors: K E Prince (Author) - Australian Nuclear Science and Technology Organisation
P J Evans (Author) - Australian Nuclear Science and Technology Organisation
G Triani (Author) - Australian Nuclear Science and Technology Organisation
Z Zhang (Author) - Australian Nuclear Science and Technology Organisation
John R Bartlett (Author) - Australian Nuclear Science and Technology Organisation
Publication details: Surface and Interface Analysis, Vol.38(12-13), pp.1692-1695
Publisher: John Wiley & Sons Ltd.
DOI: 10.1002/sia.2422
ISSN: 0142-2421
Organisation Unit: University of the Sunshine Coast, Queensland; School of Science and Engineering - Legacy
Language: English
Record Identifier: 99449821302621
Output Type: Journal article

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